1. Physically joining p-type and n-type slabs doesn’t form a proper p-n junction because their crystal lattices remain discontinuous at the interface, causing defects. True p-n junctions are created by doping a single crystal to ensure lattice continuity, enabling the essential diffusion of charge carrRead more

    Physically joining p-type and n-type slabs doesn’t form a proper p-n junction because their crystal lattices remain discontinuous at the interface, causing defects. True p-n junctions are created by doping a single crystal to ensure lattice continuity, enabling the essential diffusion of charge carriers and formation of a depletion region.

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  2. The depletion region in a p-n junction is the area near the junction where free electrons and holes recombine, leaving behind fixed ions. This creates an electric field, prevents further charge carrier movement, and acts as an insulating barrier. For more visit here: https://www.tiwariacademy.com/ncRead more

    The depletion region in a p-n junction is the area near the junction where free electrons and holes recombine, leaving behind fixed ions. This creates an electric field, prevents further charge carrier movement, and acts as an insulating barrier.

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  3. An extrinsic semiconductor is a material whose electrical conductivity is enhanced by doping it with impurities. These impurities introduce free electrons (n-type) or holes (p-type), significantly increasing charge carrier concentration compared to a pure, intrinsic semiconductor. For more visit herRead more

    An extrinsic semiconductor is a material whose electrical conductivity is enhanced by doping it with impurities. These impurities introduce free electrons (n-type) or holes (p-type), significantly increasing charge carrier concentration compared to a pure, intrinsic semiconductor.

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  4. Doping is the process of intentionally adding impurities to a pure semiconductor to increase its conductivity. These impurities introduce free electrons (n-type) or holes (p-type), altering the material's electrical properties for specific applications. For more visit here: https://www.tiwariacademyRead more

    Doping is the process of intentionally adding impurities to a pure semiconductor to increase its conductivity. These impurities introduce free electrons (n-type) or holes (p-type), altering the material’s electrical properties for specific applications.

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  5. (i) In forward bias, the depletion layer's width decreases as the applied voltage reduces the junction's potential barrier, allowing charge carriers to flow. (ii) In reverse bias, the depletion layer's width increases as the applied voltage strengthens the junction's potential barrier, preventing cuRead more

    (i) In forward bias, the depletion layer’s width decreases as the applied voltage reduces the junction’s potential barrier, allowing charge carriers to flow.

    (ii) In reverse bias, the depletion layer’s width increases as the applied voltage strengthens the junction’s potential barrier, preventing current flow.

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